Laboratory equipment at the Institute for Materials Research

Sample preparation and preparation

Light microscopic microstructural analysis

Photo: Jan Walford

Magnetic fields up to 2 Tesla
In-situ analysis under magnetic field, temperature and mechanical stress
Heating and climate chamber up to 600 °C in high vacuum
Mechanical load up to 100 MPa at up to 200°C
Kerr effects: polar, longitudinal, transverse
High-resolution camera and polarization optics
Machine learning-supported domain analysis
Piezo-stabilized sample holder with drift correction
The multifunctional wide-field Kerr microscope was acquired as part of the DFG’s major equipment initiative “Novel, Experimental Light Microscopy for Research.”

Fully motorized
Incident and transmitted light
brightfield, darkfield, DIC, POL
AxioCam HRc high-resolution digital camera

Fully motorized
Incident and transmitted light
brightfield, darkfield, DIC, POL
High-resolution digital camera
AxioCam HRc

fully motorized
incident and transmitted light
magnification 3.5 - 110x
Axiocam 512 color high-resolution digital camera

Automated digital microscope for routine tasks and error analysis
Magnification 10x to 1011x in relation to 17" monitor
Optical axis on swivel arm with continuously adjustable angle between -45° and +45°
LED coaxial and ring illumination with segmentation

Fully motorized
Scanning stage; 300 x 300 mm travel range
Sample height up to 112 mm (without stage 254 mm)
Incident light
Bright field, dark field, POL
Magnification 25x to 2500x
AxioCam 506 color high-resolution digital camera

Reflected light microscope
Coded reflector unit with brightfield, darkfield and polarization module
Coded objective nosepiece with EC Epiplan5x, 10x, 20x and 50x objective
Axiocam208 color
Manual single and tile exposure
X/Y cross table and manual Z-axis
ZEN core 2.5 application software

Stereo microscope
Zoom magnification 0.63 - 5x / eyepiece 10x
LED ring illumination
Axiocam208 color
Application software ZEN core 2.5

Electron microscopy

Photo: Jan Walford

Gemini-2 FE technology
Combined secondary electron and ion detector
ESB detector for material contrast at acceleration voltages <2kV
4-quadrant backscattered electron detector
STEM detector for transmission electron imaging
Capella Focussed Ion Beam column for sample processing on the nanometer scale (FIB)
UV short pulse laser for coarse processing
Kleindiek micromanipulator
ATLAS 3D for high-resolution FIB tomography
EDAX EDX and 3D EBSD analysis
Chemical analyses
Crystallographic analyses (determination of type and orientation) also in volume (3D)

Gemini FE technology
Secondary electron detector
4-quadrant AsB backscatter electron detector
VP secondary electron detector with the possibility of simple CL imaging
Variable pressure system for charge-free imaging of non-conductive samples
ATLAS system for large-area, high-resolution imaging
EDAX EDX, EBSD and WDX analysis
Chemical analyses using EDX
Precise determination of even light elements with WDX
Fast EBSD camera with up to 1400 FPS for crystallographic analyses (type and orientation)
Correlative microscopy between light and scanning electron microscopy

FE scanning electron microscope
Secondary and backscatter electron detectors
EDAX analyzer system with EDX
Holder systems for correlative microscopy

Real-time high-temperature diffractometry

3D computed tomography

Powder and sintering technology

Sample chamber 5L (Æ 190 x H 300 mm^2)
Temperatures up to 2000°C possible, 2 separate heaters (30 kW each)
Temperature control by means of WRe-TC or ratio pyrometer
lid cooling for gradient adjustment/directional solidification of MMC components
Hydraulic immersion system
Vacuum tank, Æ 0.5 x 1 m^2
Vacuum approx. 5x10^-4 bar/100 bar argon
Working pressure 1 to +100 bar

Four grinding stations
Grinding bowl sizes: 80, 250, 500 ml
Grinding ball diameter: 0.5 - 40 mm
Final fineness < 1 µm
Main disk speed: 50 - 400 rpm
Dry/wet grinding process possible
Grinding under protective gas possible
Programmable grinding and pause times as well as grinding cycles in reverse operation possible

Including dehumidifier B-296 and inert loop B-295
Working with organic solvents possible
Evaporator capacity: 1.0 l/hr H2O, higher for organic solvents
Air flow rate: max. 35 m³/h
Max. Max. inlet temperature: 220 °C
Heating capacity: 2300 W
Control accuracy: ± 3 °C
Spray gas compressed air or nitrogen: 200-1000 l/hr, 5-8 bar
Nozzle diameter: 0.7 mm standard, 1.4 and 2.0 mm available as accessories
Nozzle cap: 1.4 mm and 1.5 mm diameter
Average dwell time: 1.0-1.5 s
Possible particle diameter range: 1-25 μm
RS-232 interface for output of all parameters

Linn VMK-S80

Furnace chamber dimensions:
180 x 210 x 140 mm³
Tmax: 1050°C
Special features: TNV, inert gas atmosphere, vacuum

Furnace chamber dimensions: 200 x 228 x 250 mm³
Tmax: 1300°C

Furnace chamber dimensions: 160 x 300 x 80 mm³
Tmax: 1350°C

Furnace chamber dimensions 350 x 500 x 250 mm³
Tmax: 1150°

Furnace chamber dimensions: 170 x 250 x 90 mm³
Tmax: 1000°C

High-temperature tube furnace
Tmax: 1600°C
Protective gas atmosphere

Tribology

battery technology

New battery research laboratories in the "Center for Technology for Sustainability (ZTN)" research building at Aalen University of Applied Sciences.

New battery research laboratories in the "Center Technology for Sustainability (ZTN)" research building at Aalen University of Applied Sciences.

Operation under argon atmosphere in negative or positive pressure
Oxygen/water content < 1 ppm
Multi-chamber gloveboxes for different tasks:
Glovebox for cell assembly (Coin, Swagelok, Pouch, PAT)
Glovebox for powder-based solid batteries with flange-mounted high-temperature furnace (Ar atmosphere, Tmax = 1600°C) and H2S sensors for processing sulphide materials
Glovebox for metallographic preparation in an inert gas atmosphere
Glovebox for microscopic analysis in an inert gas atmosphere
Glovebox for cell opening of high-capacity cells
Further gloveboxes for inert gas analysis (RAMAN and LIBS) in procurement

Two-chamber glovebox with high-temperature furnace for the synthesis of solid-state batteries.

Various mixers for the production of electrode pastes (laboratory stirrer, planetary centrifugal mixer)
Doctor blade coater with heatable vacuum plate for electrode coating
Several laboratory calenders for electrode compaction (some heatable up to 200 °C)
Punching and cutting tool for punching out electrodes
Crimper for (dis)assembling button cells (format: CR2032)
Vacuum device for assembling pouch cells

Material process technology for the production of electrodes.

> 100 independent test channels (with channel-specific thermocouples) with
62 channels: max. 3 A / +/-6 V (CTS Lab, BaSyTec)
40 channels: max. 5 A / 0-6 V (CTS Standard, BaSyTec)
6 channels: max. 50 A / 0-4.5 V (XCTS, BaSyTec)
8 measuring channels for the connection of load cells for chemo-mechanical cell tests
9 measuring channels for specific electrochemical analyses (e.g. EIS, GITT)
5 channels: max. 400 mA / +/- 10V / 10 µHz - 1 MHz (VSP, BioLogic)
3 channels: max. 500 mA / +/- 12V / 10 µHz - 7 MHz (VSP-300, BioLogic)
1 channel: max. 100 mA / +/- 21V / 10 µHz - 250 kHz (Vertex.One.EIS, Ivium)
Multiple climate chambers for temperature control (-10°C < T < 100°C)
Multiple safety climate chambers (Hazad Level 5) (-40°C < T < 180°C)
Specific test cells and tensioning frames for variable superimposition of mechanical and electrochemical loads

CTS safety climate chamber for testing high-capacity cells (Photo: Jan Walford).

Various ball mills for mixing, grinding and homogenizing the powders
Cold isostatic and uniaxial presses, specific test cells for compacting and compressive stressing
High-temperature furnace combined with glovebox (Ar atmosphere, Tmax = 1600°C) for the synthesis and sintering of air-sensitive materials such as sulphide solid electrolytes
Several furnaces for heat treatment (Tmax = 1300°C, partly under inert gas)

Material process technology for the production of solid-state batteries.

Light microscopic analyses integrated in glovebox (stereomicroscope, inverse reflected light microscope; up to 1000x magnification, corresponding to a 100x objective)
Sputter system (Au, Au/Pd, C) integrated in glovebox
Transfer modules for sample transfer to (i) scanning electron microscope with FIB unit, EDX/WDX and EBSD XRD and (ii) XRD incl. climate chamber with heating function up to 1050°C and operando measuring cell
Confocal Raman microscope and laser-induced plasma spectroscope (LIBS) in procurement

Analytical glovebox with light microscope for inert gas analysis (Photo: Jan Walford).

magnetometry

QD-PPMS-9 multifunctional magnetometer
Measurements in the temperature range 1.9 K to 1000 K and field range -9 T .... 9 T
Measurements of the full hysteresis curve, kink point measurements, reversibility measurements, relaxation measurements Determination of the magnetic parameters µ0HC, JR, (BH)max DC/AC measurements
Torque function
Microscope function: AFM/MFM (atomic force/magnetic force unit) for visualizing the scattered fields of domain structures, SHP (scanning Hall probe unit) for quantitative determination of local scattered fields, in each case as a function of field and temperature
Max. Heat compensation 1000 W

Computer-controlled Permagraph C-300
Measurements in the temperature range RT to 200°C
Measurements of the hysteresis curve in the 2nd quadrant up to - 2 Tesla
Determination of the magnetic parameters µ0HC, JR, (BH)max
FeCo pole pieces
Magnetometry: length/width min. 0.5 cm x 0.5 cm, max. 2 cm x 1.5 cm, height > 1 mm

Pulse magnetizer
Magnetizing coil 52.0 mm (aperture) x 60 mm (active length)
Magnetizing with aperiodically damped discharge
Variable field pulse up to a maximum of 7.2 Tesla for complete saturation of the magnets

Moment coil type MS 150 for measuring the magnetic moment and dipole moment of permanent magnets
Free aperture 140 mm
Dimensions for 1% accuracy: max. magnet height 50 mm, max. diameter 70 mm

Determination of soft magnetic parameters in AC and DC according to IEC 60404-ff, repeatability 0.1%
Alternating field measurements between 1 Hz and 100 kHz
Sine, free waveforms, bias measurements, new curve
Sample geometries: Epstein strips, plate and ring samples
Maximum current 40 A, maximum voltage 100 V
Measurements under temperature possible (< 300°C)

20 Hz to 20 MHz
16047E Test fixture for components with axial connections
Measurement parameters: |Z|, |Y|, θ, R, X, G, B, L, C, D, Q, Z (complex)
Basic accuracy of the impedance measurement: ± 0.08 %
Number of measuring points: 2 to 1,601
Measurements under bias

Soft magnet measuring device Keysight E4990A impedance analyzer

3D measurement of magnetic fields of hard magnets
Measuring range: 1.5 T
Measuring accuracy of the magnetic field: 0.1%
Measurement possible in 4 axes (X, Y, Z and rotation)
Resolution: 2 µm (X, Y, Z), 0.02° (rotation)
Measuring volume: 135 x 135 x 135 mm

Process technology additive manufacturing

Lightweight construction/connection technology